Benchtop pattern generator: Heidelberg µPG 101

Benchtop pattern generator: Heidelberg µPG 101
Transnational Access Activity/Installation
TA3. Prototype fabrication • TA3.4. Nanoimprinting & laser patterning

Equipment: Heidelberg µPG 101
Technique: Tabletop Micro Pattern Generator
Contact person (AlmaScience): Luís Pereira (luis.pereira@almascience.pt)
Responsible: Diana Gaspar (diana.gaspar@almascience.pt)

Description: Tabletop micropattern generator for direct writing applications and low volume mask fabrication, compatible with up to 6” substrates and enabling features sizes with 600 nm resolution.


  • UV Laser diode, 375 nm, 70 mW for exposure of positive and negative resist, including SU8
  • Camera system for substrate inspection and automatic alignment
  • PC for system control and data conversion (DXF, CIF and GDSII), with built-in LayoutEditor CAD software for pattern design/editing
  • Real-time autofocus
  • Two writing modes:
  • Mode I – minimum structure size 0.6 µm, write speed 1 mm2/min, write area 5 cm x 5 cm
  • Mode IV – minimum structure size 5 µm, write speed 90 mm2/min, write area 12.5 cm x 12.5 cm
  • Substrate size from 1 cm x 1 cm to 15 cm x 15 cm
  • Substrate thickness up to 12 mm

Link for additional information: https://www.weizmann.ac.il/ChemicalResearchSupport/sites/ChemicalResearchSupport/files/uploads/upg101_ug3_user_guide_rev9_current.pdf