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TA3.4. Nanoimprinting & laser patterning

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SCIL technology is particularly suitable for high demand imprint processes.
Tabletop micropattern generator for direct writing applications and low volume mask fabrication, compatible with up to 6” substrates and enabling features sizes with 600 nm resolution.
The desktop VLS3.50 is small enough to fit on a work surface yet powerful enough to meet the requirements of on-demand production.
The PLS6MW (Multi-Wavelength) is a free-standing platform that uses multiple laser wavelengths to process the broadest possible spectrum of materials and supports either CO2 or fiber lasers.
Our roll-to-roll nanoimprint lithography (roll-to-roll NIL, R2R NIL) facilitates continuous and therefore cost-effective production of micro and nanopatterns on large-area flexible substrates.
JR´s step&repeat technology is based on an EVG 770 wafer stepper. It is used for pattern upscaling via UV imprint lithography to mainly generate flexible, polymer-type shims.
Maskless laser lithography system for creating high quality 1D, 2D and continuos-relief microstructures on large areas. With our patented technology we can furdermore fabricate such structures on 3D macro (planar and curved) objects to obtain new effects and functionalities.