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Thermal properties measurement setup

Thermal properties measurement setup
Transnational Access Activity/Installation
TA2. Material synthesis and ink formulation

Equipment: Analysis of the thermal properties of metal, ceramic or organic thin films

Technique: Netzsch, PicoTR

Description:

Determination of the thermal diffusivity and thermal effusivity of single or multilayer systems in a range of 10 nm until 900 nm (depending on the material). Thermal conductivity and interfacial thermal resistance of layers can be evaluated from the measurement results.

Specifications:

  • Pump Beam (1550 nm): ∅ 45 µm – high power (Eavg = 25 mW)
  • Probe Beam (775 nm): ∅ 25 µm – low power
  • Resolution: 1 ps (observation time 50 ns)
  • Temperature: RT up to 500°C
  • Atmosphere: N2 and Ar
  • Two measurement modes
  • Front heating/Front Detection
  • Rear heating/Front Detection, (substrate = transparent (1550 nm))
  • Sample requirements:
    • X = 20 mm (practicable 10 mm)
    • Y = 20 mm (practicable 10 mm)
    • Z < 20 mm (practicable 5 – 2.5 mm)
    • Non metals – reflection coating on the top
    • Mo, Al, Pt (thickness: ~100 nm)
    • Surface roughness < 15 nm (rms)