Equipment: Ellipsometer EP4
Technique: Ellipsometry to determine n&k
Acquisition year: 2015
Responsible: Christian Hänisch/
Description: Optical method to determine n&k values. Measurement ideally on standard substrates (silicon substrates)
Specifications:
- 360-1000nm
- angles from 40 to 90deg
- sample stage for xy-movement + 360° rotation (mapping option in software)
- software package for data analysis
- standards available for calibration
