TA2.1. Materials characterization

Equipment: UV-Vis Spectrophotometer Shimadzu Technique:  Contact Person: (UNINOVA): Alexandra Gonçalves (amfg@fct.unl.pt) Description: Our Shimadzu UV-3101PC is equipped with an ISR-260 Integrating Sphere Attachment. This...

Equipment: PalmSens 4 Technique: Potentiostat/Galvanostat Contact Person: (UNINOVA): Tomás Pinheiro (tp.pinheiro@campus.fct.unl.pt) Description: The PalmSens4 is a hand-held battery powered instrument for use with electrochemical...

Equipment: FTIR-ATR Thermo Scientific Nicolet iS50 Technique: Fourier Transform Infrared Spectroscopy with in bench ATR Contact Person: (UNINOVA): Rita Branquinho (ritasba@fct.unl.pt) Description: High resolution...

Equipment: FTIR-ATR Thermo Scientific Nicolet SummitX (compact) Technique: Fourier Transform Infrared Spectroscopy Contact Person: (UNINOVA): Rita Branquinho (ritasba@fct.unl.pt) Description: FTIR (Fourier Transform Infrared Spectroscopy)...

Equipment: AFM – Park Systems FX40 Technique: Atomic Force Microscopy Contact Person: (UNINOVA): Tomás Calmeiro (t.calmeiro@fct.unl.pt) Description: An atomic force microscope is a type...

Equipment: UV-2401PC Technique: Semi-automatic measurement of Hansen solubility parameters based on the binary solvent method using UV-VIS spectroscopy in combination with pipetting robot for...

Equipment: FR Basic Technique: Transmittance, Absorbance and Reflectance measurements Acquisition year:  Contact person: Responsible: Description: The FR Basic by Theta Metrisis can perform Transmittance,...

Technique: Thermal Interface Material Analyzer (TIMA 5) Acquisition year: 2024 Contact person (RISE): Yusuf Mulla (yusuf.mulla@ri.se) Responsible: Ioannis Petsagkourakis (ioannis.petsagkourakis@ri.se) Description: A system for...

 SoA optical spectroscopy system to measure thin-film absorption, transmission and reflection.

 State-of-the-Art X-Ray diffraction system (Bragg-Brentano geometry) and gracing incidence driffaction. 2D Detector (Lyx-Eye).

UPS (ultraviolet photoelectron spectroscopy) can measure HOMO position, ionization potential and vacuum level of metals and semiconducting materials.

Optical method to determine n&k values. Measurement ideally on standard substrates (silicon substrates)