Equipment: Horiba-JobinYvon-UVISEL
Technique: Spectroscopic Ellipsometer
Acquisition year: 2004
Responsible: Hugo Águas /
Description: Ellipsometry is based on the measurement of the light polarization change upon reflection from a sample surface or interface. The experimental data are usually expressed as two parameters ψ and Δ, which are related to the Fresnel reflection coefficients. These relate to material optical properties and physical dimensions.
Specifications:
- Spectral range from 190 to 2100 nm, with a complete application database included in the software
- Excellent signal/noise ratio from FUV to NIR; No insensitive regions
- Accurate on ultra-thin film measurement on transparent substrates
- Accurate measurement of Δ around 0° and 180°
- Up to 1 ms per point for applications such as dynamic studies and liquid – surface measurements
- High speed and digital signal averaging
- Acquisition and analysis of ellipsometric, kinetic, transmission and reflection data
- Advanced mathematical fitting algorithms
- Bibliographic reference database – extendable
- Enhanced Modelling Functions: Graded layer; Roughness or interface; Composition / crystallinity; Anisotropic layer; Thickness uniformity; Depolarization factor; Complete library of material properties based on dispersion relations
- Automatic backside correction for thick transparent substrates; Periodic structure; BLMC for ultra-thin film applications
Link for additional information (if any):
https://www.horiba.com/int/scientific/products/spectroscopic-ellipsometry/
