Software: Silvaco’s™ TCAD tools
Technique: Technology Computer-Aided Design (TCAD) simulation
Contact person (UNINOVA): Pedro Barquinha (pmcb@fct.unl.pt), Ana Rovisco (a.rovisco@fct.unl.pt)
Responsible: Jorge Martins (jds.martins@campus.fct.unl.pt)
Description: A suite of tools by SILVACO™ for TCAD simulation of semiconductor technologies. The physical-based simulation provides both predictability and insight into the physical-mechanisms of device operation.
Specifications:
Process simulation (“Athena”):
- Simulation of device fabrication processes (mainly MOSFET-related): Oxidation, Implantation, Deposition, etch, and lithography steps
- Prediction structure morphology and properties (carrier concentration, material stress, etc) based on fabrication steps
Device simulation (“Atlas”):
- Electrical simulation of devices (which can be either “user-drawn” or “fabricated” in Athena)
- Requires definition of models and material properties (some already existing in the database)
- Different temperatures and optical stimulus can be applied
- Modules for quantum, photoelectronics, LED, TFT, organics, noise and thermal simulations.
- DC, AC, or transient simulation
- 2D or 3D simulation
- Enables the visualization of the physical quantities inside the device
Link for additional information: https://silvaco.com/tcad/
