Nanoimprint lithography: SUSS MicroTec

Nanoimprint lithography: SUSS MicroTec
Transnational Access Activity/Installation
TA3. Prototype fabrication • TA3.4. Nanoimprinting & laser patterning

Equipment: SUSS MicroTec  – Substrate Conformal Imprint Lithography (SCIL)
Technique: Nanoimprint lithography
Contact person (AlmaScience): Luís Pereira (luis.pereira@almascience.pt)
Responsible: Diana Gaspar (diana.gaspar@almascience.pt)

Description: SCIL technology is particularly suitable for high demand imprint processes. Here a soft stamp is used in combination with a hard but flexible glass carrier, thereby achieving superior evenness of contact and exceptionally high fidelity in pattern transfer. SCIL technology is suited for all highly demanding processes where a high-quality etching mask is employed, such as the production of optical elements as well as in the production of TFTs.


  • Soft stamp on glass backplate (flexible stamp)
  • Chuck for 4” wafers with wafer thickness compensation
  • Sequential stamp imprint and separation from resist
  • Automated process (manual tunning possible for specific application needs)
  • Good residual layer control
  • High resolution (40 nm line patterns tested) and high uniformity in 4” wafer
  • Low-pressure imprint
  • PDMS stamp manufacturing toolset from rigid masters

Link for additional information: https://www.suss.com/en/imprint-lithography