Description: Zeiss Auriga combines a high-resolution SEM for imaging materials and devices at nanoscale with a FIB column enabling precise milling. The tool has multiple detectors including in-lens and out-lens SE and BSE, a large area EDS (150 mm2) and EBSD. It also has a gas injector system for localized deposition of materials. In-situ heating experiments and electrical characterization are also possible. Besides a wide range of nanoanalysis capabilities, the tool can also be used for TEM lamela preparation.
Main technical specifications
- SEM column – Schottky Field Emitter, resolution of 1.0 nm @ 15 kV, 1.9 nm @ 1 kV, acceleration voltage between 0.1 and 30 kV
- FIB column – Ga liquid metal ion source (LMIS), resolution <7 nm @ 30 kV, acceleration voltage between 1 and 30 kV, probe current between 1 pA and 50 nA
- SE and EsB detectors – Everhart-Thornley type SE, In-lens SE and in-lens EsB. Mix-mode possible by tuning grid polarization of detectors
- Large area EDS detector Oxford X-Max 150 with Aztec software for elemental and chemical analysis with high count rates and low beam current. Detection from beryllium (Be) to californium (Cf)
- Microstructure characterization with Oxford Nordlys II-S EBSD, integrated with Aztec software
- Gas injector system for SEM or FIB-assisted local deposition of C, Pt and SiO2, selective etching of dielectrics with XeF2, local charge compensation to reduce charging effects in non-conductive samples
- Heating stage Kammrat & Weiss, for in-situ analysis under heating up to 1050 °C;
- 4 Kleindiek nanotechnik nanomanipulators for electrical measurements of nanodevices and TEM lamela preparation
- Load-lock chamber for fast and contamination free sample loading-unloading.
Type of samples
- Protocols for preparation of multiple forms of solid samples available (bulk, powder, thin film…), including biological samples (after dehydration)
- Sample size from few mm up to approx 2”.
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