Setup for I-V, C-V time dependent and pulsed-IV measurements in substrates up to 4” (2” max recommended), on cryogenic probe station with optical arm...
A four-point-probe technique for measuring semiconductor resistivities, which is easy to implement, nondestructive, and especially convenient for probing the wafers used in device fabrication.
The HMS-3000 Hall Measurement System is a complete system for measuring the resistivity, carrier concentration, and mobility of semiconductors using the Van Der Pauw...
Atomic Force Microscope system for small and medium size samples, consisting of completely decoupled XY & Z scanners using flexure guided scan system for...
The APS04 system combines two different techniques: Ambient pressure Photoemission Spectroscopy (APS) (absolute work function Φ/IE/HOMO) and high-resolution Kelvin Probe KP.
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