TA4.1. Device metrology & characterization

Setup for I-V and time dependent measurements in substrates up to 2”, at room temperature, with dark box enclosure.

Setup for I-V and time dependent measurements in substrates up to 6”, from room temperature to 300 °C, with dark box enclosure.

Zeiss Auriga combines a high-resolution SEM for imaging materials and devices at nanoscale with a FIB column enabling precise milling.

Mechanical peel testing machine Mark-10 with a ESM303 test stand with a series 5 force gauge and G1008 film and paper grip.

Two available climate chambers for controlled humidity and temperature experimentation.

Customizable measurement setups for the characterization of electrochromic displays

Advanced equipment for electrical characterization of materials, components, devices and circuits in ESD protected area (EPA).

The Anton-Paar Rheometer is a quick and convenient method to measure the rheology of inks. 

The JEOL JSM-IT 100 is a compact SEM designed for fast imaging. In SEM a cathode ray focused to nm size is scanned over...

Atomic Force Microscopy (AFM) is a high resolution scanning probe microscope with resolution on the order of sub nanometer.

Electron beam lithography (EBL) is a method for creating ultra-fine, nanometer-sized structures in modern nanotechnology. It is an important instrument in semiconductor technology, used...

This setups allows for calibrated, reproducible measurements to evaluate the performance of ferroelectric sensors including hysteresis poling thereof.